| 是否进口：是 | 原产国/地区：美国 | 加工定制：是 |
| 品牌：Kurt J. Lesker/科莱特思科 | 电镀位置：溅射和蒸镀 | 镀种：真空镀膜 |
| 镀膜原理：溅射镀膜 | 型号：PRO Line PVD 75 |
The Kurt J. Lesker Company? PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.
The PRO Line PVD 75 is compatible with the following techniques:
Thermal Evaporation (up to four 4" individual boats, or six 2" boat assemblies)
TORUS? Magnetron Sputtering sources (up to six 2" or 3" sources)
Electron Beam Evaporation Source (4 pocket 8cc, 8 pocket 12cc, 6 pocket 20cc)
LTE10 Organic deposition sources (up to two)
Combinations of the above techniques are also available.
Custom configurations are available upon request
科特莱思科公司的 PRO Line PVD 75? 是基于PVD75***款开发的***薄膜沉积系统。全球保有量超过500台，PVD75?***款是历经实践验
证的技术成熟、性能稳定、多功能设计的薄膜沉积系统。PRO Line PVD 75? 在PVD75***款基础上进一步提高系统的本底真空并缩短系统的抽
空时间。对工艺腔室进行优化设计，工业化设计的控制系统具有***的编程能力，支持自动进样，创新***的设计为薄膜性能优化提供了很多的支持。
PRO Line PVD 75与以下技术兼容：
热蒸镀（最多可安装4个4”独立的舟，或者6个2”的舟组件）
TORUS?磁控靶枪（最多可安装6个2”或3”）
电子束蒸发源（可选4x8cc，8x12cc和6x20cc）
LTE低温有机材料蒸发源（最多可安装2个）
支持以上技术的组合
可根据要求提供自定义配置
